Ion Beam Milling

  • Variable Angle Ion Milling

    When resolving the smallest features, varying the angle of incidence of the ion flux allows for precision adjustment of surface-feature edges and sidewall angles.

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  • Surface Modification

    By tuning the ion mill energy to the activation energy of your substrate species, surfaces reaction sites can be activated to create bonding sites.

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  • Broad Beam

    By using a broad-beam ion source instead of a focused beam to mill target substrates, a high degree of edge-to-edge uniformity can be achieved.

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  • Ion Beam Sputtering

    IBS is a thin film deposition technique that uses an ion source to sputter a target material and direct it towards the substrate.

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  • Channel Milling

    A flux of focused high energy ions, are used to create trenches in a substrate by directing them through a mask material.

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  • Holographic Gratings

    Ion milling to produce high quality patterned gratings via photoresist or masking processes, Holographic filters and gratings require multiple sizes of precisely structured features.

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