News & Blog

Nanofabrication Using Glancing Angle Deposition

Glancing angle deposition (GLAD) is a nanofabrication technique that is an extension of oblique angle deposition in which the substrate incline is manipulated during film deposition.
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Come Visit Intlvac Thin Film at SPIE Defense + Commercial Sensing in Baltimore

Heralded as a leading global sensing, imaging, and photonics technologies event, the SPIE Defense + Commercial Sensing show attracts nearly 5000 attendees every year. Intlvac Thin Film is pleased to be among the 380 exhibiting companies at this unique international conference where photonics and immerging technologies of the future intersect.
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Looking Forward to SPIE Photonics West 2019

Over 20,000 people attend the photonics and laser industry’s flagship event each year. Photonics West includes the entire spectrum of light-driven technologies and attracts researchers, companies and product developers from around the world.
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Intlvac Thin Film Joins NanoCanada Mission to Toyko in January 2019

Intlvac Thin Film looks forward to participating in Nanotech Japan at Tokyo Big Sight on January 28 to February 1, 2019.
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Intlvac Introduces the Nanochrome IV UV VIS Optical Filter Production System

Intlvac Thin Film is pleased to introduce their newest precision optical coating platform, the Nanochrome IV UV/Vis Optical Filter Production System. The Nanochrome IV system is designed to produce complex optical filters, anti-reflective coating, dielectric and UV Vis filters via e-beam evaporation with ion assist.
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Advantages of Ion Beam Sputter Deposition

Ion Beam Sputter Deposition (IBSD) is a physical vapor deposition method which utilizes a remote broad ion/plasma beam source to bombard a grounded (floating) target and sputter target material onto a substrate.
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Understanding Ion Beam Etching (Milling)

Ion Beam Etching (or Milling) is a dry plasma etch method which utilizes a remote broad beam ion/plasma source to remove substrate material by physical inert gas and/or chemical reactive gas means. Like other dry plasma etch techniques, the typical figures of merit apply, such as etch rate, anisotropy, selectivity, uniformity, aspect ratio, and substrate damage. However, ion beam etching advances additional dry etch merits, which include wide range of materials, precision etch stops, indiffere...
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What is Sputtering?

Sputtering is a thin-film manufacturing process widely used across many industries including semiconductor processing, precision optics, and surface finishing. Sputtered thin films have excellent uniformity, density and adhesion making them ideal for multiple applications.
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