E-Beam or Electron Beam Evaporation is a thin film deposition technique where a highly focused electron beam is directed toward a high purity source material to be evaporated. The beam of electrons is generated from a filament and is focused and steered with magnets toward the source material. One of the advantages of E-Beam Evaporation is the ability to rotate several source materials into the path of the electron so that multiple thin films can be deposited sequentially without breaking vacuum.