In the process of thin film deposition, we produce layers nanometers to microns thick on a surface in order to impart specific properties not necessarily inherent in the bulk material.

Glancing angle deposition (GLAD) is a nanofabrication technique that is an extension of oblique angle deposition in which the substrate incline is manipulated during film deposition.

Intlvac Thin Film looks forward to participating in Nanotech Japan at Tokyo Big Sight on January 28 to February 1, 2019.

Intlvac Thin Film is pleased to introduce their newest precision optical coating platform, the Nanochrome IV UV/Vis Optical Filter Production System. The Nanochrome IV system is designed to produce complex optical filters, anti-reflective coating, dielectric and UV Vis filters via e-beam evaporation with ion assist.

Ion Beam Sputter Deposition (IBSD) is a physical vapor deposition method which utilizes a remote broad ion/plasma beam source to bombard a grounded (floating) target and sputter target material onto a substrate.

Ion Beam Etching (or Milling) is a dry plasma etch method which utilizes a remote broad beam ion/plasma source to remove substrate material by physical inert gas and/or chemical reactive gas means. Like other dry plasma etch techniques, the typical figures of merit apply, such as etch rate, anisotropy, selectivity, uniformity, aspect ratio, and substrate damage. However, ion beam etching advances additional dry etch merits, which include wide range of materials, precision etch stops, indiffere...

Sputtering is a thin-film manufacturing process widely used across many industries including semiconductor processing, precision optics, and surface finishing. Sputtered thin films have excellent uniformity, density and adhesion making them ideal for multiple applications.