Providing Technology Solutions since 1996
At Intlvac, we specialize in Etch, Evaporation, Sputter, and PECVD process technologies, forming the cornerstone of our expertise.
With decades of expertise in thin film coating and etching tools, Intlvac has perfected systems for advanced processes like E-Beam and Thermal Evaporation, DC Magnetron Sputtering, and Plasma-Assisted Reactive Sputtering. Using these techniques, we deliver high-quality coating services across a wide range of materials and complex geometries.
Find every component for the Mark I and Mark II Ion Sources in our online store. With parts in stock and next-day shipping.
Intlvac is the exclusive Canadian distributor for Leybold vacuum products and certified service.
The Nanoquest II is a precision-engineered Ion Beam Etching (IBE) system developed to meet the stringent demands of advanced microfabrication, photonics, and materials research. Built on an ultra-high vacuum (UHV) platform with stainless steel construction and active thermal management, the Nanoquest II offers unparalleled stability, cleanliness, and process repeatability.
At its core is a 22 cm RF Inductively Coupled Plasma (ICP) gridded ion source, delivering ion energies from 100 to 1200 eV with beam currents exceeding 1 Amp. With its universal etching capability, the system excels at processing a wide variety of materials, including diamond, crystalline substrates such as silicon, silicon dioxide, titanium dioxide, quartz, glass, and lithium niobate, as well as all classes of metals.
The filamentless ionization design ensures long service life with minimal maintenance, while self-aligning ion optics provide highly uniform beam profiles and consistent process results.
A water-cooled, rotating, and tilting substrate stage enables tight thermal control and precise angular etching, making it possible to engineer sidewall profiles, achieve sub-micron pattern fidelity, and protect temperature-sensitive films. The Nanoquest II integrates a HMI-based automation platform with full recipe control, process data logging, and user-level permissions, enabling both rapid process development and repeatable production runs.
With ±3% in-plane uniformity over a 100 mm substrate and ±2% wafer-to-wafer repeatability, the Nanoquest II provides a robust, high-yield solution for applications requiring low-damage, high-precision pattern transfer in optical, electronic, and quantum devices.
The Nanoquest II integrates a self-illuminating microscope camera into the load-lock chamber without breaking vacuum. Mounted on a precision XY stage with vibration control, it resolves features down to 1µm and displays images directly on the system interface. Combined with automated or manual load-lock operation, this design minimizes downtime and keeps your lab running at peak efficiency, even with challenging materials.
The load-lock chamber supports substrates up to 100 mm in diameter and is accessed through a quick-entry top door with a viewport.
The Nanoquest II is powered by Intlvac's modern PLC and computer-based control architecture, providing full automation for system supervision, process observation, and data management. A HMI-driven, Windows-based graphical interface makes operation intuitive while ensuring robust process control.
Available as a Cluster Tool, Individual Modules, or an In-House On-Demand Service.
Nanoquest II is a precision ion beam etching system designed for advanced R&D in photonic device fabrication. Using a broad-beam ion source and adjustable substrate motion, it enables smooth, uniform material removal across LiNbO₃ and other challenging materials. Its tunable energy control, in-situ cooling, and flexible masking options ensure exceptional etch quality, making it ideal for fabricating next-generation lithium niobate components.
Nanochrome™ IV uses Plasma Assisted Reactive Magnetron Sputtering (PARMS) to deposit dense, uniform oxide and nitride films essential for lithium niobate device fabrication. These coatings enable precise masking, passivation, and optical tuning while maintaining pristine material interfaces. Integrated within Intlvac’s cluster environment, Nanochrome IV ensures clean, repeatable processing for high-performance photonic and quantum applications.
Aegis DLC enables precision etching for LNOI waveguide fabrication through Plasma-Enhanced Chemical Vapor Deposition (PECVD) of a diamond-like carbon hardmask. Its high hardness, adhesion, and selectivity ensure accurate pattern transfer during ion beam etching, producing smooth, high-fidelity lithium niobate structures essential for advanced photonic and quantum devices.
The Nanoquest II is the core system in Intlvac’s Nanoquest Suite of precision ion beam etching and milling tools, designed for advanced material modification and pattern transfer. Building on the compact Nanoquest Pico and Nanoquest I, it offers enhanced beam control, superior uniformity, and stable performance across metals, dielectrics, and semiconductors. Positioned between R&D and production-scale systems, the Nanoquest II delivers the ideal balance of flexibility, precision, and throughput for research and pilot manufacturing.