Providing Technology Solutions since 1996
At Intlvac, we specialize in Etch, Evaporation, Sputter, and PECVD process technologies, forming the cornerstone of our expertise.
With decades of expertise in thin film coating and etching tools, Intlvac has perfected systems for advanced processes like E-Beam and Thermal Evaporation, DC Magnetron Sputtering, and Plasma-Assisted Reactive Sputtering. Using these techniques, we deliver high-quality coating services across a wide range of materials and complex geometries.
Find every component for the Mark I and Mark II Ion Sources in our online store. With parts in stock and next-day shipping.
Intlvac is the exclusive Canadian distributor for Leybold vacuum products and certified service.
The Nanoquest III/IV Batch Ion Beam Etching System from Intlvac Thin Film is among the most economical and versatile production ion beam etching platforms on the market today. Designed for clean room operation, this system provides automated control of ion beam energy and etch angle, enabling precision processes from simple inert etching to complex reactive operations.
Versatile and Economical
Superior Etch Uniformity
The Nanoquest III/IV is tailored for clean room use, with the etch module positioned in the service area to ensure minimal contamination. Its double-door design allows for servicing from either side, and UHV design rules enable extremely low base pressures. High-speed vacuum pumps ensure rapid pump down and reduce ion beam gas collisions.
Chamber Construction: Stainless steel using UHV-compatible techniques, electro-polished exterior
Cooling System: Welded stainless steel cooling channels in a web-like pattern for efficient heat dissipation
Access & Observation: Hinged front and rear doors, multiple viewports including optional load lock view
Vacuum Performance:
Vacuum Pump Options: Dry pumps with optional Cryopump or Maglev Turbo pump
Highlights:
Precision, repeatable etch control is achieved with the optional Secondary Ion Mass Spectrometry (SIMS) system.
Standard Capabilities:
The LabVIEW-based control system provides complete, intuitive control through a graphical interface. Full automation sequences include:
Whether etching complex patterns or handling high volumes, the Nanoquest III/IV stands out with:
The Nanoquest Pico offers the performance and flexibility needed for advanced thin film etching applications—all in a compact, lab-friendly form factor.
The Nanoquest III Ion Beam Etching System combines a water-cooled, rotating stage, a 16cm RF ion source, an easily accessible stainless steel vacuum chamber, cryogenic high vacuum pumping system, automatic pump down and venting, atmosphere to high vacuum gauging, mass flow controllers, chamber cabinet, and electronic control console.
Designed for clean room operation, the Nanoquest III keeps the etch module in the service area of the clean room. System components, such as shields and other serviceable items, are easily accessed in the service area. A double door etch module allows servicing from either side of the chamber. UHV design rules ensure that the etch module and load lock chamber achieve very low base pressures. High speed vacuum pumps not only provide a fast pump down, but also reduce ion beam gas collisions.