Providing Technology Solutions since 1996
At Intlvac, we specialize in Etch, Evaporation, Sputter, and PECVD process technologies, forming the cornerstone of our expertise.
With decades of expertise in thin film coating and etching tools, Intlvac has perfected systems for advanced processes like E-Beam and Thermal Evaporation, DC Magnetron Sputtering, and Plasma-Assisted Reactive Sputtering. Using these techniques, we deliver high-quality coating services across a wide range of materials and complex geometries.
Find every component for the Mark I and Mark II Ion Sources in our online store. With parts in stock and next-day shipping.
Intlvac is the exclusive Canadian distributor for Leybold vacuum products and certified service.
The Intlvac Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics, and Semiconductors. Designed with flexibility in mind, the system can be configured for a variety of ion sources and gases, depending on your application.
With a 14” D-shaped chamber and a small footprint, the Nanoquest Pico is engineered to fit into any laboratory setting. It is ideal for fast etching of thin films that are not compatible with conventional chemical or dry etching methods.
The Nanoquest Pico is designed for etching small wafers and dies, making it especially well-suited for fast, precise etching in R&D environments. The system supports ion beam and reactive ion beam etching, with multiple ion source configurations available to match a wide range of materials and process requirements.
The Nanoquest Pico is the ultimate compact ion milling platform for research and development of thin film applications such as Data Storage, Spintronics, and Semiconductors. It can be configured for a number of ion sources and gases depending on your application. With its 16” D-shaped chamber and small footprint, it can fit into any lab.
The Nanquest Pico is designed to etch small wafers and dies and is ideal for fast etching of thin films that do not respond well to conventional chemical or dry etching processes.