Ion Beam Assisted Deposition (IBAD) is an advanced vacuum-based deposition method which utilizes a remote broad beam ion/plasma source to modify thin film growth by bombardment with energetic and reactive ions. The energy modifies growth dynamics and when applied to standard deposition techniques, can produce desirable thin film growth effects. This can result in improved durability, stress control, and environmental stability of intrinsic material functions as in the case of absorption and refraction in optical films. Typically, ion beam assisted deposition is engineered into a variety of deposition techniques such as evaporation and ion beam sputtering.